发明名称 |
BAKING TOOL FOR IMPROVED WAFER COATING PROCESS |
摘要 |
Baking methods and tools for improved wafer coating are described. In one embodiment, a method of dicing a semiconductor wafer including integrated circuits involves coating a surface of the semiconductor wafer to form a mask covering the integrated circuits. The method involves baking the mask with radiation from one or more light sources. The method involves patterning the mask with a laser scribing process to provide a patterned mask with gaps, exposing regions of the substrate between the ICs. The method may also involves singulating the ICs, such as with a plasma etching operation. |
申请公布号 |
US2015255346(A1) |
申请公布日期 |
2015.09.10 |
申请号 |
US201414200918 |
申请日期 |
2014.03.07 |
申请人 |
PARK Jungrae;LEI Wei-Sheng;PAPANU James S.;EATON Brad;KUMAR Ajay |
发明人 |
PARK Jungrae;LEI Wei-Sheng;PAPANU James S.;EATON Brad;KUMAR Ajay |
分类号 |
H01L21/78;B23K10/00;B23K26/36 |
主分类号 |
H01L21/78 |
代理机构 |
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代理人 |
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主权项 |
1. A method of dicing a semiconductor wafer comprising integrated circuits (ICs), the method comprising:
coating a surface of the semiconductor wafer to form a mask covering the ICs; baking the mask with radiation from one or more light sources that illuminate an entire upper surface of the mask; and patterning the mask with a laser scribing process to provide a patterned mask with gaps, exposing regions of the semiconductor wafer between the ICs. |
地址 |
Santa Clara CA US |