发明名称 BAKING TOOL FOR IMPROVED WAFER COATING PROCESS
摘要 Baking methods and tools for improved wafer coating are described. In one embodiment, a method of dicing a semiconductor wafer including integrated circuits involves coating a surface of the semiconductor wafer to form a mask covering the integrated circuits. The method involves baking the mask with radiation from one or more light sources. The method involves patterning the mask with a laser scribing process to provide a patterned mask with gaps, exposing regions of the substrate between the ICs. The method may also involves singulating the ICs, such as with a plasma etching operation.
申请公布号 US2015255346(A1) 申请公布日期 2015.09.10
申请号 US201414200918 申请日期 2014.03.07
申请人 PARK Jungrae;LEI Wei-Sheng;PAPANU James S.;EATON Brad;KUMAR Ajay 发明人 PARK Jungrae;LEI Wei-Sheng;PAPANU James S.;EATON Brad;KUMAR Ajay
分类号 H01L21/78;B23K10/00;B23K26/36 主分类号 H01L21/78
代理机构 代理人
主权项 1. A method of dicing a semiconductor wafer comprising integrated circuits (ICs), the method comprising: coating a surface of the semiconductor wafer to form a mask covering the ICs; baking the mask with radiation from one or more light sources that illuminate an entire upper surface of the mask; and patterning the mask with a laser scribing process to provide a patterned mask with gaps, exposing regions of the semiconductor wafer between the ICs.
地址 Santa Clara CA US