发明名称 ION BEAM IRRADIATION DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To prevent reducing an ion beam quantity involved in substrate processing by facilitating beam current distribution adjustment with a correction device 5.SOLUTION: An ion beam irradiation device IM, having a correction device 5 for beam current distribution adjustment in the lengthwise direction of ion beams IB of a ribbon shape in cross section, includes a convergent lens 4 that converges ion beams IB in the lengthwise direction (Y direction) of the ion beams IB, the lens being positioned on the upstream side of the correction device 5 in a transportation path of the ion beams IB.</p>
申请公布号 JP2015164142(A) 申请公布日期 2015.09.10
申请号 JP20150117216 申请日期 2015.06.10
申请人 NISSIN ION EQUIPMENT CO LTD 发明人 SAMI K HAHTO;YAMAMOTO TETSURO;IAI TETSUYA;KUWATA YUSUKE
分类号 H01J37/317;H01J37/12;H01L21/265 主分类号 H01J37/317
代理机构 代理人
主权项
地址