发明名称 |
ION BEAM IRRADIATION DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To prevent reducing an ion beam quantity involved in substrate processing by facilitating beam current distribution adjustment with a correction device 5.SOLUTION: An ion beam irradiation device IM, having a correction device 5 for beam current distribution adjustment in the lengthwise direction of ion beams IB of a ribbon shape in cross section, includes a convergent lens 4 that converges ion beams IB in the lengthwise direction (Y direction) of the ion beams IB, the lens being positioned on the upstream side of the correction device 5 in a transportation path of the ion beams IB.</p> |
申请公布号 |
JP2015164142(A) |
申请公布日期 |
2015.09.10 |
申请号 |
JP20150117216 |
申请日期 |
2015.06.10 |
申请人 |
NISSIN ION EQUIPMENT CO LTD |
发明人 |
SAMI K HAHTO;YAMAMOTO TETSURO;IAI TETSUYA;KUWATA YUSUKE |
分类号 |
H01J37/317;H01J37/12;H01L21/265 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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