SAMPLE MICROMOTION MECHANISM, METHOD OF USING THE SAME, AND CHARGED PARTICLE DEVICE

摘要

Provided is a sample micromotion mechanism adapted to minimize an influence of a disturbance and adjust a sample drift rapidly and with high accuracy, and designed so as to be a compact, easy-to-place sample micromotion mechanism of a side-entry type that suppresses the occurrence of the sample drift and generates/displays high-resolution monitoring images and precisely drawn patterns. A charged particle device employing the sample micromotion mechanism is also provided.;In the charged particle device, the sample micromotion mechanism operates followed by deformation which causes a strain. A strain measuring unit measures such strain. The sample micromotion mechanism imparts micromotion so as to reduce the strain in accordance with the measured strain value, thereby reducing deformation of the sample micromotion mechanism.

主权项

1. A charged particle device, comprising:
a charged particle beam source for generating a charged particle beam; a charged particle optical system for controlling a path for the charged particle beam to propagate; a sample micromotion mechanism containing a sample holder to support a sample irradiated with the charged particle beam, the mechanism being configured to impart micromotion to the sample holder and position the sample; and a sensor unit for detecting the charged particle beam transmitted through the sample, wherein: the sample micromotion mechanism further includes a strain measuring unit to measure strain in a constituent member of the sample micromotion mechanism; and after positioning the sample, the sample micromotion mechanism imparts micromotion to the sample holder so as to counteract an amount of the strain in accordance with the amount of strain measured by the strain measuring unit.