CHEMICALLY-AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERNING PROCESS USING THE SAME

摘要

The present invention provides a chemically-amplified positive resist composition including a sulfonium salt capable of providing a pattern having an extremely high resolution with low line edge roughness, and also provides a resist patterning process using the same.;The present invention was accomplished by a chemically-amplified positive resist composition including: (A) a salt represented by the following general formula (1); and (B) a resin containing a repeating unit represented by the following general formula (U-1) that dissolves by acid action and increases solubility in an alkaline developer, and a resist patterning process using the same.;

主权项

1. A chemically-amplified positive resist composition for high energy beam exposure comprising: (A) a salt represented by the following general formula (1); and (B) a resin containing a repeating unit represented by the following general formula (U-1) that dissolves by acid action and increases solubility in an alkaline developer, wherein R0 represents a hydrogen atom, or a linear monovalent hydrocarbon group having 1 to 20 carbon atoms or a branched or a cyclic monovalent hydrocarbon group having 3 to 20 carbon atoms with which a hetero atom may be substituted or in which a hetero atom may be included; each R01 and R02 independently represents a hydrogen atom, or a linear monovalent hydrocarbon group having 1 to 20 carbon atoms or a branched or a cyclic monovalent hydrocarbon group having 3 to 20 carbon atoms with which a hetero atom may be substituted or in which a hetero atom may be included, and R01 and R02 may mutually be bonded to form a cyclic structure together with a carbon atom bonded by the same and a carbon atom between the same, and at least one of R0, R01 and R02 has a cyclic structure; each R101, R102 and R103 independently represents a linear monovalent hydrocarbon group having 1 to 20 carbon atoms or a branched or a cyclic monovalent hydrocarbon group having 3 to 20 carbon atoms with which a hetero atom may be substituted or in which a hetero atom may be included, and two or more of R101, R102 and R103 may mutually be bonded to form a cyclic structure together with a sulfur atom in the formula; and L represents a single bond, or any of an ester bond, a sulfonic acid ester bond, a carbonate bond, and a carbamate bond, each of which is formed together with an adjacent oxygen atom, wherein “q” represents 0 or 1; “r” represents an integer of 0 to 2; R1 represents any of a hydrogen atom, a fluorine atom, a methyl group, and a trifluoromethyl group; each R2 independently represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; B1 represents a single bond, or an alkylene group having 1 to 10 carbon atoms that may contain an ether bond; “a” represents an integer satisfying a≦+2r−b; and “b” represents an integer of 1 to 3.