| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target for forming a transparent film capable of DC-sputtering a ZnO-SiO-AlOfilm having a lower refractive index than an AZO film, and to provide a production method thereof.SOLUTION: A sputtering target contains Al:0.3-4.0wt.%, Si:6.0-14.5wt.% to the total metal component content, and also contains a residue which comprises an oxide sintered body having a component composition comprising Zn and inevitable impurities, and in which complex oxides ZnSiOand ZnO exist in the structure of the sintered body, and the density of the sintered body is 100-108% in terms of the theoretical density ratio. |
