METHOD AND APPARATUS FOR ALIGNING NANOWIRES DEPOSITED BY AN ELECTROSPINNING PROCESS

摘要

Embodiments of the invention generally include apparatus and methods for depositing nanowires in a predetermined pattern during an electrospinning process. An apparatus includes a nozzle for containing and ejecting a deposition material, and a voltage source coupled to the nozzle to eject the deposition material. One or more electric field shaping devices are positioned to shape the electric field adjacent to a substrate to control the trajectory of the ejected deposition material. The electric field shaping device converges an electric field at a point near the surface of the substrate to accurately deposit the deposition material on the substrate in a predetermined pattern. The methods include applying a voltage to a nozzle to eject an electrically-charged deposition material towards a substrate, and shaping one or more electric fields to control the trajectory of the electrically-charged deposition material. The deposition material is then deposited on the substrate in a predetermined pattern.

主权项

1. An apparatus for electrospinning a material on a substrate, comprising:
a reservoir for containing a deposition material; a nozzle in fluid communication with the reservoir, the nozzle adapted to deliver the deposition material to a surface of a substrate; a substrate support movable relative the nozzle, the substrate support adapted to support the substrate adjacent to the nozzle; a voltage source coupled to the nozzle to apply an electric potential to the nozzle to eject the deposition material from the nozzle; and one or more coils positioned around a process region located between the nozzle and the substrate support, the one or more coils adapted to influence the trajectory of the deposition material ejected from the nozzle.