| 摘要 |
In an inspection apparatus having a projection device for projecting pattern light and an obliquely arranged camera, a technology is provided with which favorable measurement performance for measuring solder shapes is realized. If an illumination device is provided with openings for projection devices, then the openings are formed at azimuth directions that are from the X-axis direction and the Y-axis direction. If both an opening for a projection device and an opening for an obliquely arranged camera are provided, then they are arranged at different azimuth directions. Alternatively, it is also possible to provide a supplementary illumination device to supplement deficiencies in the illumination light due to the openings. Alternatively, it is also possible to match the optical axes of the projection device and the obliquely arranged camera and to provide a shared opening. |
| 主权项 |
1. An inspection apparatus having a camera for photographing a substrate onto which components are soldered from a direction orthogonal thereto,
wherein, taking an intersection of an optical axis of the camera with a substrate conveyed into the inspection apparatus as a point of origin, taking a direction that is parallel to a substrate surface and parallel to a conveyance direction of the substrate as an X-axis, taking a direction that is parallel to the substrate surface and orthogonal to the conveyance direction of the substrate as a Y-axis, taking a direction that is orthogonal to the substrate surface as a Z-axis, taking an angle with respect to the Z-axis as a zenith angle, and taking a direction from the point of origin and within the XY-plane as an azimuth direction, the inspection apparatus comprises: an illumination device that is configured to illuminate the substrate from all azimuth directions with illumination light whose color or brightness changes stepwise or continuously depending on the zenith angle; one or more projection devices that are configured to project pattern light onto the substrate from a direction that is oblique with respect to the Z-axis; and a processing device that is configured to perform an inspection using an image of the substrate that is photographed with the camera in a state in which the illumination device is turned on or in a state in which pattern light is projected from the one or more projection devices; the one or more projection devices projecting the pattern light onto the substrate through one or more openings that are provided in the illumination device; and the one or more openings being provided at one or more azimuth directions that are different from both the X-axis direction and the Y-axis direction, as viewed from the point of origin. |
