发明名称 PATTERN-FORMING METHOD AND COMPOSITION
摘要 A pattern-forming method includes forming a prepattern that is insoluble or hardly soluble in an organic solvent. A resin layer is provided on at least a lateral face of the prepattern. The prepattern and the resin layer are heated such that an adjacent portion of the resin layer to the prepattern is made insoluble or hardly soluble in the organic solvent, without being accompanied by an increase of a molecular weight of the prepattern and the resin layer. A portion of the resin layer other than the adjacent portion of the resin layer is removed. The resin layer is formed from a first composition including a first polymer and an organic solvent. Solubility of the first polymer in the organic solvent does not substantially change due to an action of an acid. A weight average molecular weight of the first polymer is 15,000-150,000.
申请公布号 US2015253670(A1) 申请公布日期 2015.09.10
申请号 US201514641677 申请日期 2015.03.09
申请人 JSR CORPORATION 发明人 FUKAMI Kanako
分类号 G03F7/16;C09D133/12;C08K5/36;G03F7/30 主分类号 G03F7/16
代理机构 代理人
主权项 1. A pattern-forming method comprising: forming a prepattern that is insoluble or hardly soluble in an organic solvent; providing a resin layer on at least a lateral face of the prepattern; heating the prepattern and the resin layer such that an adjacent portion of the resin layer to the prepattern is made insoluble or hardly soluble in the organic solvent, without being accompanied by an increase of a molecular weight of the adjacent portion of the resin layer; and removing with the organic solvent, a portion of the resin layer other than the adjacent portion of the resin layer such that a resist pattern is obtained, wherein the resin layer is formed from a first composition comprising: a first polymer; and an organic solvent, solubility of the first polymer in the organic solvent not substantially changing due to an action of an acid, and a weight average molecular weight of the first polymer is no less than 15,000 and no greater than 150,000.
地址 Tokyo JP