发明名称 PATTERN-FORMING METHOD AND DIRECTED SELF-ASSEMBLING COMPOSITION
摘要 A pattern-forming method includes providing a coating film using a composition that includes: a first polymer which is a block copolymer; and a second polymer having a surface free energy lower than a surface free energy of the first polymer, such that the second polymer is unevenly distributed to be localized into a superficial layer region of the coating film. Phase separation is caused in the coating film along a direction substantially perpendicular to a thickness direction of the coating film such that at least a part of the coating film is converted into a directed self-assembling film which includes a plurality of phases. A part of the plurality of phases of the directed self-assembling film is removed.
申请公布号 US2015252216(A1) 申请公布日期 2015.09.10
申请号 US201514638844 申请日期 2015.03.04
申请人 JSR CORPORATION 发明人 MINEGISHI Shinya;NARUOKA Takehiko;NAGAI Tomoki
分类号 C09D153/00 主分类号 C09D153/00
代理机构 代理人
主权项 1. A pattern-forming method comprising: providing a coating film using a composition that comprises: a first polymer which is a block copolymer; and a second polymer having a surface free energy lower than a surface free energy of the first polymer, such that the second polymer is unevenly distributed to be localized into a superficial layer region of the coating film; causing phase separation in the coating film along a direction substantially perpendicular to a thickness direction of the coating film such that at least a part of the coating film is converted into a directed self-assembling film which comprises a plurality of phases; and removing a part of the plurality of phases of the directed self-assembling film.
地址 Tokyo JP