发明名称 |
PATTERN-FORMING METHOD AND DIRECTED SELF-ASSEMBLING COMPOSITION |
摘要 |
A pattern-forming method includes providing a coating film using a composition that includes: a first polymer which is a block copolymer; and a second polymer having a surface free energy lower than a surface free energy of the first polymer, such that the second polymer is unevenly distributed to be localized into a superficial layer region of the coating film. Phase separation is caused in the coating film along a direction substantially perpendicular to a thickness direction of the coating film such that at least a part of the coating film is converted into a directed self-assembling film which includes a plurality of phases. A part of the plurality of phases of the directed self-assembling film is removed. |
申请公布号 |
US2015252216(A1) |
申请公布日期 |
2015.09.10 |
申请号 |
US201514638844 |
申请日期 |
2015.03.04 |
申请人 |
JSR CORPORATION |
发明人 |
MINEGISHI Shinya;NARUOKA Takehiko;NAGAI Tomoki |
分类号 |
C09D153/00 |
主分类号 |
C09D153/00 |
代理机构 |
|
代理人 |
|
主权项 |
1. A pattern-forming method comprising:
providing a coating film using a composition that comprises: a first polymer which is a block copolymer; and a second polymer having a surface free energy lower than a surface free energy of the first polymer, such that the second polymer is unevenly distributed to be localized into a superficial layer region of the coating film; causing phase separation in the coating film along a direction substantially perpendicular to a thickness direction of the coating film such that at least a part of the coating film is converted into a directed self-assembling film which comprises a plurality of phases; and removing a part of the plurality of phases of the directed self-assembling film. |
地址 |
Tokyo JP |