Device and Method for the Treatment of Flat Material to Be Treated

摘要

The device 1 according to the invention is suggested for gentle treatment of a flat material B to be treated with a treatment liquid F. The device 1 has the following components: at least one treatment chamber 20, in which the treatment liquid F can be accumulated up to a bath level M, at least one supply device 7 for the supply of the treatment liquid F into the at least one treatment chamber 20, at least one transport device 30, with which the material B to be treated can be transported in the horizontal position in a transport plane E below the bath level M through the at least one treatment chamber 20, at least one reception area 4 for the treatment liquid F, and at least one discharge device 40 with, respectively, at least one discharge opening 41 for the treatment liquid F for conveying it from the at least one treatment chamber 20 with a respective discharge rate into the at least one reception area 4. The at least one discharge device 40 respectively has at least one regulating system 43, with which the discharge rate of the treatment liquid F is adjustable through the at least one discharge opening 41.

主权项

1. A device (1) for the chemical or electrolytic treatment of flat material to be treated (B) with a treatment liquid (F), having
at least one treatment chamber (20), in which the treatment liquid (F) can be accumulated up to a bath level (M); at least one supply device (7) for the supply of treatment liquid (F) into the at least one treatment chamber (20); at least one transport device (30), with which the flat material (B) to be treated can be transported in a horizontal position in a transport plane (E) below the bath level (M) through the at least one treatment chamber (20); at least one reception area (4) for the treatment liquid (F); and at least one discharge device (40) with, respectively, at least one discharge opening (41) for the treatment liquid (F) for conveying the treatment liquid (F) from the at least one treatment chamber (20) with a respective discharge rate into the at least one reception area (4);wherein the at least one discharge device (40) respectively has at least one regulating system (43), with which the discharge rate of the treatment liquid (F) through the at least one discharge opening (41) is adjustable,
wherein at least one screen device (60), respectively, is arranged between the at least one treatment chamber (20) and the at least one discharge device (40) and a respective discharge chamber (61) is formed between the at least one screen device (60) and the at least one discharge opening (41);characterized in that
the at least one screen device (60) has, respectively, at least one passage opening (62) for the passage of the treatment liquid (F) into the at least one discharge chamber (61), which is arranged at the height level of the transport plane (E) for the material (B) to be treated, and the at least one screen device (60) forms, respectively, at least partially a bottom of the treatment chamber (20) and essentially extends parallel to a lower wall of the discharge chamber (61) and is spaced from the latter, so that a passage distance is formed between the lower wall of the discharge chamber (61) and the screen device (60), the screen device (60) forming a passage opening (62).