| 发明名称 |
Method of producing a semiconductor wafer |
| 摘要 |
<p>A semiconductor wafer (100) having a regular pattern of predetermined separation lanes (102) is provided, wherein the predetermined separation lanes (102) are configured in such a way that the semiconductor wafer is singularizable along the regular pattern.</p> |
| 申请公布号 |
EP2530709(B1) |
申请公布日期 |
2015.09.09 |
| 申请号 |
EP20110168688 |
申请日期 |
2011.06.03 |
| 申请人 |
NXP B.V. |
发明人 |
SCHMITT, FLORIAN;SCHEUCHER, HEIMO;ZIESMANN, MICHAEL |
| 分类号 |
H01L21/78;H01L23/544 |
主分类号 |
H01L21/78 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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