发明名称 |
ABRASIVE ARTICLES, CMP MONITORING SYSTEM AND METHOD |
摘要 |
<p>The disclosure relates to abrasive articles useful in chemical-mechanical polishing (CMP), the articles including a substrate with opposite major surfaces, an abrasive material overlaying at least a portion of at least one of the major surfaces, and at least one of a radio frequency identification (RFID) tag, a RFID tag reader, or a sensor for providing CMP information to a transmitter positioned near the substrate, the transmitter positioned near the substrate and adapted to wirelessly receive CMP information and wirelessly transmit the CMP information to a remote receiver. The disclosure also relates to a CMP pad conditioner for wirelessly communicating CMP information to a remote receiver, a CMP process monitoring system for wirelessly communicating CMP information to a remote receiver, and a method for conditioning a CMP pad using a CMP process monitoring system for wireless communicating CMP information to a remote receiver.</p> |
申请公布号 |
EP2035187(A4) |
申请公布日期 |
2015.09.09 |
申请号 |
EP20070811930 |
申请日期 |
2007.05.24 |
申请人 |
3M INNOVATIVE PROPERTIES COMPANY |
发明人 |
BEHR, ANDREW H.;GOERS, BRIAN D.;LARAIA, VINCENT J.;PALMGREN, GARY M.;PENDERGRASS, DANIEL B. JR. |
分类号 |
B24B37/04;B24B49/12;H01L21/304 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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