| 摘要 |
<p>The present invention provides a plasma processing device and a plasma processing method using a spiral resonator suppressing a reflected wave. The plasma processing device of the present invention comprises: a processing chamber which is disposed inside a decompressable vacuum container, and wherein a plasma for processing a sample of an object to be processed disposed therein; a means for supplying gas for generating the plasma inside the processing chamber; a vacuum exhaust unit for exhausting the air inside the process chamber; a spiral resonant apparatus having a spiral resonant coil installed on the external side of the vacuum container, and an electrically grounded shield disposed on the external side of the spiral resonant coil; a high power supply of the variable frequency, which supplies high-frequency power in a predetermined range to the resonant coil. In the plasma processing device, an electrical length of the resonant coil is set to be an integer multiple of a first wavelength in the predetermined frequency. Furthermore, the plasma processing device includes a frequency matching unit capable of adjusting the frequency of the high frequency power to minimize the reflection power. A power feeding point of the spiral resonant coil is connected to a ground level by using a tunable capacitive device.</p> |
