发明名称 Gate-all-around carbon nanotube transistor with doped spacers
摘要 <p>A method of fabricating a semiconducting device is disclosed. A carbon nanotube is formed on a substrate. A portion of the substrate is removed to form a recess below a section of the carbon nanotube. A doped material is applied in the recess to fabricate the semiconducting device. The recess may be between one or more contacts formed on the substrate separated by a gap.</p>
申请公布号 GB2523936(A) 申请公布日期 2015.09.09
申请号 GB20150010917 申请日期 2013.08.16
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 AARON D FRANKLIN;SIYURANGA O KOSWATTA;JOSHUA T SMITH
分类号 H01L51/05;B82Y10/00 主分类号 H01L51/05
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