发明名称 |
POLISHING COMPOSITION |
摘要 |
[Abstract] Provided is a polishing composition with which a high glossy surface is achieved by enhancing smoothness of a surface of an alloy material while maintaining a sufficiently high polishing speed for the alloy material. The present invention relates to a polishing composition used for an application of polishing an alloy material, which contains silica particles having a primary particle average aspect ratio of at least 1.10 and a pH controlling agent. |
申请公布号 |
EP2915859(A1) |
申请公布日期 |
2015.09.09 |
申请号 |
EP20130850813 |
申请日期 |
2013.06.25 |
申请人 |
FUJIMI INCORPORATED |
发明人 |
TAMAI, KAZUSEI;ASAI, MAIKO;MORINAGA, HITOSHI |
分类号 |
C09K3/14;B24B37/00;C09G1/02 |
主分类号 |
C09K3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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