| 摘要 |
The present invention provides a film forming apparatus that allows formation of a high-quality film on a substrate, effective use of a solution in a film forming process, and downsizing of the apparatus as a whole. The film forming apparatus according to the present invention includes a spray nozzle (1), a first chamber (2), a first gas supply port (3a), a second chamber (4), a through hole (5), and a mist outlet (10). A solution transformed into droplets that is to be sprayed from the spray nozzle (1) is housed in the first chamber (2) and transformed into a mist in the first chamber by gas injected from the first gas supply port (3a). The solution in mist form moves from the first chamber through the through hole (5) to the second chamber and is misted onto a substrate (50) from the mist outlet (10) of the second chamber (4). |
