| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a device for mask evaluation, capable of measuring physical quantities corresponding to the line width distribution and the clearance distribution of a pattern formed on a photo mask, for quantitative evaluation or inspection of the uniformity of the pattern.SOLUTION: The device includes: a light source device 1; a first lens system 4 which projects a light beam ejected from the light source device toward the rear face having no mask pattern of a photo mask 6 disposed on a stage 7; a second lens system 9 which collects reflection light reflecting at the interface between a glass substrate of the photo mask and the mask pattern, penetrating through the glass substrate, and ejecting from the rear face; and optical detection means 10 which receives the light collected by the second lens system. The interface between the chromium film of the mask pattern and the glass substrate is kept clean without exposure to the outside after once formed, without being affected from etching. Accordingly, the measurement of the intensity of reflection light from the interface enables the measurement of the density and dimensions of the mask pattern.</p> |
