| 发明名称 | Emitter structure, gas ion source and focused ion beam system | ||
| 摘要 | There is provided an emitter structure, a gas ion source including the emitter structure, and a focused ion beam system including the gas ion source. The emitter structure includes a pair of conductive pins which are fixed to a base member, a filament which is connected between the pair of conductive pins, and an emitter which is connected to the filament and has a sharp tip. A supporting member is fixed to the base material, and the emitter is connected to the supporting member. | ||
| 申请公布号 | US9129771(B2) | 申请公布日期 | 2015.09.08 |
| 申请号 | US201414224149 | 申请日期 | 2014.03.25 |
| 申请人 | HITACHI HIGH-TECH SCIENCE CORPORATION | 发明人 | Yasaka Anto;Sugiyama Yasuhiko;Oba Hiroshi |
| 分类号 | G21K5/04;H01J27/26;H01J37/08;H01J1/15;H01J1/18;H01J3/04 | 主分类号 | G21K5/04 |
| 代理机构 | Adams & Wilks | 代理人 | Adams & Wilks |
| 主权项 | 1. An emitter structure comprising: a pair of conductive pins which are fixed to a base member; a filament which is connected between the pair of conductive pins; and an emitter which is connected to the filament and has a sharp tip; wherein a supporting member is fixed to and extends through the base member, and the emitter is connected to the supporting member. | ||
| 地址 | JP | ||