发明名称 Cleaning method
摘要 Disclosed is a low-cost and resource-saving cleaning method wherein high cleaning effects are obtained by high-pressure jet cleaning or two-fluid cleaning using a gas-dissolved water. In the high-pressure jet cleaning method or the two-fluid cleaning method, a cleaning liquid or a mixed fluid of the cleaning liquid and a gas is jetted from a cleaning fluid jetting nozzle toward a subject to be cleaned, and the subject is cleaned. The cleaning liquid introduced into the cleaning fluid jetting nozzle contains the dissolved gas in a quantity equal to or more than the saturation solubility at the liquid temperature of the cleaning liquid.
申请公布号 US9129797(B2) 申请公布日期 2015.09.08
申请号 US201013518583 申请日期 2010.12.21
申请人 KURITA WATER INDUSTRIES LTD. 发明人 Tokoshima Hiroto;Morita Hiroshi
分类号 H01L21/02;H01L21/67 主分类号 H01L21/02
代理机构 代理人 Kanesaka Manabu
主权项 1. A cleaning method by high-pressure jet cleaning or two-fluid cleaning, comprising: a step of jetting a cleaning liquid or a mixed fluid of the cleaning liquid and a carrier gas from a jetting nozzle toward a subject of an electronic material to be cleaned and thereby cleaning the subject, wherein the cleaning liquid is at room temperature, the cleaning liquid introduced into the jetting nozzle contains a dissolved gas prepared by dissolving a gas in degassed water with a gas-dissolving membrane module in a quantity of 1.5 to 3 times as large as a saturation solubility at a temperature of the cleaning liquid, a pressure in a feed water piping connecting the gas-dissolving membrane module and the jetting nozzle is controlled thereby to prevent generation of bubbles in the cleaning liquid, the gas is supplied to a gas-phase room of the gas-dissolving membrane module through a gas supply piping having a gas flow regulating valve, the gas-phase room has a first pressure indicator measuring a pressure V1 in the gas-phase room, the feed water piping has a feed water regulating valve and a second pressure indicator measuring a water feed pressure V2 at a downstream side relative to the feed water regulating valve, and V1<V2 is satisfied with the gas flow regulating valve and the feed water regulating valve.
地址 Tokyo JP