发明名称 Laser-enhanced chemical etching of nanotips
摘要 A method for sharpening a nanotip involving a laser-enhanced chemical etching is provided. The method includes immersing a nanotip in an etchant solution. The nanotip includes a base and an apex, the apex having a diameter smaller than a diameter of the base. The method also includes irradiating the nanotip with laser fluence to establish a temperature gradient in the nanotip along a direction from the apex to the base of the nanotip such that the apex and base are etched at different rates.
申请公布号 US9128117(B2) 申请公布日期 2015.09.08
申请号 US201314097211 申请日期 2013.12.04
申请人 GLOBALFOUNDRIES SINGAPORE PTE. LTD. 发明人 Mai ZhiHong;Lam Jeffrey C.;Bin Dawood Mohammed Khalid;Ng Tsu Hau
分类号 H01L21/302;G01Q70/16;B82Y35/00;C25F3/08 主分类号 H01L21/302
代理机构 Horizon IP Pte. Ltd. 代理人 Horizon IP Pte. Ltd.
主权项 1. A method of forming an integrated circuit (IC) device, comprising: sharpening a nanotip, the sharpening comprising: immersing the nanotip in an etchant, the nanotip comprising a base and an apex, the apex having a diameter smaller than a diameter of the base, andirradiating the nanotip with laser fluence to establish a temperature gradient in the nanotip along a direction from the apex to the base of the nanotip such that the apex and base are etched at different rates; performing wafer metrology on a wafer having a plurality of devices using the sharpened nanotip to measure device performance.
地址 Singapore SG