发明名称 Ultraviolet light emitting diode array light source for photolithography and method
摘要 A light source includes a plurality of ultraviolet (UV) light emitting diodes (LEDs) and an LED phase shift controller coupled to the plurality of UV LEDs adapted to control the phase shift of each UV LED in the plurality of UV LEDs. The plurality of UV LEDs forms a UV LED array. An ultraviolet lithography system can include a light source as described above. The system can further include a mirror assembly in a light path of the light source, the mirror assembly having a polarization mirror with an interference coating. A method provides a light source for an ultraviolet lithography system including the element of providing an plurality of UV LEDs that emit UV light and the element of controlling a phase shift of the plurality of UV LEDs with an LED phase shift controller coupled to each UV LED or arrays of the UV LEDs in the plurality of UV LEDs.
申请公布号 US9128387(B2) 申请公布日期 2015.09.08
申请号 US201313893368 申请日期 2013.05.14
申请人 Taiwan Semiconductor Manufacturing Co., Ltd. 发明人 Shih Jaw-Lih;Chou Hong-Hsing;Wang Yeh-Chieh;Chang Hsin-Kuo;Chen Chung-Nan;Cheng Kuang Hsiung
分类号 G03F7/20;G02B26/06 主分类号 G03F7/20
代理机构 Duane Morris LLP 代理人 Duane Morris LLP
主权项 1. A light source, comprising: a plurality of ultraviolet (UV) light emitting diodes (LEDs), wherein the plurality of UV LEDs comprise a UV LED array or a combination of UV LED arrays; an LED phase shift controller coupled to the plurality of UV LEDs adapted to control a phase shift of each UV LED or all UV LEDs in the plurality of UV LEDs; and a homogenizer adapted to control the UV LED array or the combination of UV LED arrays in the plurality of UV LEDs in an X, Y, and Z direction to adjust a tilt and a height of the plurality of UV LEDs relative to an optical path.
地址 Hsin-Chu TW