Edge ring for a thermal processing chamber

摘要

Embodiments of the present invention provide an edge ring for supporting a substrate with increased temperature uniformity. More particularly, embodiments of the present invention provide an edge ring having one or more fins formed on an energy receiving surface of the edge ring. The fins may have at least one sloped side relative to a main body of the edge ring.

主权项

1. An edge ring for supporting a substrate in a processing chamber, comprising:
a ring shaped body having an inner edge, an outer edge, an upper side and a lower side, wherein the inner edge and outer edge are concentric about a central axis; a lip extending radially inward from the inner edge of the ring shaped body, wherein an upper surface of the lip is substantially planar and substantially parallel to a major plane that is perpendicular to the central axis; and one or more surface area increasing structures extending from at least one of the upper side or lower side of the ring shaped body, wherein the one or more surface area increasing structures has at least one sloped side relative to the ring shaped body.