发明名称 Device and method for coating a substrate using CVD
摘要 The invention relates to a device for coating a substrate (14) using CVD, in particular for coating with diamond or silicon, wherein a heat conductor array comprising a plurality of elongated heat conductors (2) is provided in a housing (10), said heat conductors extending between a first (1) and a second electrode (8), wherein the heat conductors (2) are held individually tensioned by a tensioning device attached to one end thereof. For the purposes of improving the life of the heat conductors (2), the invention proposes that the tensioning device comprises a tilt arm (5) having a tensioning weight (G), the heat conductor (2) being attached to the first end (E1) of said tilt arm, and the second end thereof substantially being mounted pivotably about a horizontal axis (H).
申请公布号 US9127350(B2) 申请公布日期 2015.09.08
申请号 US200913130728 申请日期 2009.11.13
申请人 DIACCON GMBH;CEMECON AG 发明人 Rueffer Martin;Rosiwal Stefan;Bareiss Christian;Reichert Walter;Lemmer Oliver;Perle Marc
分类号 C23C16/27;C23C16/24;H01L21/67 主分类号 C23C16/27
代理机构 代理人 Kanesaka Manabu
主权项 1. A device for coating a substrate using CVD, for coating with diamond or silicon, comprising: a heating conductor array comprising a plurality of heating conductors, each being electrically connected with a first electrode and a second electrode and being longitudinally extended and arranged next to each other in an essentially horizontal plane, wherein the second electrode comprises a plurality of tension units, each tension unit is individually movable relative to the first electrode so that each of the plurality of heating conductors is held taut in a straight line between the first electrode and the second electrode, each tension unit comprises a swivel arm having a tension weight, and each of the plurality of heating conductors is mounted on a first end of the swivel arm and a second end of the swivel arm is mounted pivotably essentially around a horizontal axis.
地址 Fuerth DE