发明名称 Method for producing oxide/hydroxide
摘要 Provided is a method for producing an oxide and/or hydroxide wherein the ratio of oxide and hydroxide has been controlled. The method produces an oxide, a hydroxide, or a mixture thereof, and obtains an oxide and/or a hydroxide wherein the ratio of oxide and hydroxide has been controlled by means of changing a specific condition relating to at least one fluid to be processed introduced between processing surfaces (1, 2) when causing the precipitation of the oxide, hydroxide, or mixture thereof by mixing an basic fluid containing at least one type of basic substance and a fluid containing at least one type of metal or metallic substance as the fluids to be processed between the processing surfaces (1, 2) that are provided facing each other, are able to approach to and separate from each other, and of which at least one rotates relative to the other. The specific condition is at least one condition selected from the group consisting of: the speed of introduction of at least one of the fluids to be processed; and the pH of at least one of the fluids to be processed.
申请公布号 US9127331(B2) 申请公布日期 2015.09.08
申请号 US201114112887 申请日期 2011.04.28
申请人 M. Technique Co., Ltd. 发明人 Kuraki Jun;Maekawa Masaki;Honda Daisuke;Enomura Masakazu
分类号 C22B19/00;C22B19/34;C01B13/32;C01B13/34;C01G9/02;C01G9/03;B01F7/00;B01F15/02;B01F3/08;B82Y30/00 主分类号 C22B19/00
代理机构 Birch, Stewart, Kolasch & Birch, LLP 代理人 Birch, Stewart, Kolasch & Birch, LLP
主权项 1. A method for producing a mixture of an oxide and a hydroxide, comprising the steps of: providing at least two fluids to be processed including a first fluid and a second fluid, wherein the first fluid contains at least one of a metal or a metal compound, and the second fluid is different from the first fluid and is a basic fluid which contains at least one basic substance; mixing the first and second fluids in a thin film fluid formed between at least two processing surfaces which are disposed in a position facing each other so as to be able to approach to and separate from each other, at least one of the at least two processing surfaces rotating relative to the other; producing the mixture of the oxide and the hydroxide by separating the mixture of the oxide and the hydroxide from the thin film fluid; and controlling a ratio of the oxide to the hydroxide contained in the mixture of the oxide and the hydroxide to a predetermined ratio during the separation by changing a specific condition with regard to at least one of the first fluid or the second fluid being introduced into between the at least two processing surfaces, wherein the specific condition is at least one condition selected from the group consisting of an introduction velocity of at least one of the first fluid or the second fluid, andpH of at least one of the first fluid or the second fluid.
地址 Izumi-shi JP