发明名称 |
Imprint method, imprint apparatus, and article manufacturing method |
摘要 |
An imprint method includes an inspection step of inspecting a substrate to obtain information of a foreign substance on the substrate; and a film forming step of forming a film covering the foreign substance, using the information of a foreign substance on the substrate, wherein the film forming step is performed before the contact step. |
申请公布号 |
US9128371(B2) |
申请公布日期 |
2015.09.08 |
申请号 |
US201213478287 |
申请日期 |
2012.05.23 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Kurosawa Hiroshi |
分类号 |
B29C59/02;B05C11/00;B05C9/06;B05D1/36;B05D3/12;G03F7/00;B82Y10/00;B82Y40/00 |
主分类号 |
B29C59/02 |
代理机构 |
Rossi, Kimms & McDowell LLP |
代理人 |
Rossi, Kimms & McDowell LLP |
主权项 |
1. An imprint method comprising a dispensing step of dispensing a resin on a substrate on which a plurality of chip regions are formed, using a first coating device, a contact step of bringing the dispensed resin into contact with a mold, and a curing step of curing the resin in contact with the mold,
the method further comprising: an inspection step of inspecting the substrate to obtain information on a foreign substance which exists on the substrate; and a film forming step of forming a film covering the foreign substance by dispensing, using a second coating device different from the first coating device, a material different from the resin onto or around the foreign substance only in a chip region on the substrate where the foreign substance exists based on the information on the foreign substance obtained in the inspection step, wherein, in the dispensing step, the resin, which is brought into contact with the mold, is dispensed in the chip regions on the substrate, where the foreign substance does not exist, by dispensing the resin directly onto the substrate. |
地址 |
JP |