发明名称 PATTERN FORMATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a pattern formation method capable of forming a pattern at a predetermined cissing speed.SOLUTION: In a pattern formation method, a pattern is formed on the surface of a substrate having a hydrophilic part and a hydrophobic part on the surface. The method comprises a step of forming a hydrophilic solution equal to or less than 6.2 μm in thickness on the surface of the substrate. In the state where the hydrophilic solution is applied, the inter-surface force difference between the hydrophilic part and the hydrophobic part is 0.0055 Pa or more, and the hydrophilic solution has a viscosity of 2.6 mPa s or less.
申请公布号 JP2015160152(A) 申请公布日期 2015.09.07
申请号 JP20140035232 申请日期 2014.02.26
申请人 FUJIFILM CORP 发明人 MIYAMOTO MASAAKI
分类号 B05D5/06;B05D5/04;H05K3/10;H05K3/12 主分类号 B05D5/06
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