| 发明名称 |
COMPOSITION FOR PHOTORESIST STRIPPER |
| 摘要 |
<p>The present invention relates to a photoresist stripping liquid composition. More specifically, provided is a photoresist stripping liquid composition comprising at least two species of an alkylene glycol-tertiary-butyl ether-based compound, which can minimize damage to an insulation body, with an excellent removal rate of a photoresist.</p> |
| 申请公布号 |
KR20150102354(A) |
申请公布日期 |
2015.09.07 |
| 申请号 |
KR20140024119 |
申请日期 |
2014.02.28 |
| 申请人 |
ENF TECHNOLOGY CO., LTD. |
发明人 |
LEE, SANG DAI;PARK, YOUNG JIN;JEON, KYEONG MIN;LIM, CHAN KYU |
| 分类号 |
G03F7/42;H01L21/027 |
主分类号 |
G03F7/42 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
