Semiconductor device and method of manufacturing the same

摘要

A method of manufacturing a semiconductor device includes forming isolation layers in a first direction at trenches at isolation regions defined at a semiconductor substrate and forming gate lines in a second direction crossing the first direction over the isolation layers and active regions defined between the isolation layers, performing a dry-etch process to remove the isolation layers, and forming an insulating layer over the semiconductor substrate to form a first air gap extending in the first direction in the trenches and a second air gap extending in the second direction between the gate lines.

主权项

1. A semiconductor device, comprising:
trenches formed in a first direction in parallel at isolation regions of a semiconductor substrate; first air gaps formed in the trenches; gate lines formed in a second direction crossing the first direction over the first air gaps and active regions of the semiconductor substrate between the isolation regions; an interlayer insulating layer formed over the semiconductor substrate including the gate lines; and second air gaps formed between the gate lines in the interlayer insulating layer, wherein the gate lines comprise select gate lines and cell gate lines between the select gate lines, and the first air gaps in the trenches are isolated below the select gate lines.