SUBSTRATE PROCESS APPARATUS

摘要

The present invention relates to a substrate processing apparatus. The substrate processing apparatus includes: a main body which has an opened upper part, an internal space, and an exhaust hole formed on a lower part; a top lid which is formed on the upper part of the main body and partly covers the upper part of the main body; a substrate supporter which is formed on the main body and supports the substrate; and a gas injection body which faces the substrate supporter on the top lid and injects process gas to the substrate support part. An extension part is formed on the top lid. The extension part is extended vertically and forms a space for processing the substrate. An exhaust path of the process gas is formed in the space for processing the substrate. The exhaust path is formed between the edge of the substrate supporter and the inner wall of the extension part. Therefore, the space of processing the substrate can be easily formed.