| 摘要 |
<p>The present invention aims to provide a source of an OLED deposition apparatus wherein a deposition material is evenly sprayed through a plurality of nozzles. As the source for an OLED deposition apparatus, according to the present invention, including a deposition chamber (10) inside which a substrate (S) for deposition is vertically loaded and one or more sources (20) which are installed inside the deposition chamber (10) and heat and evaporate the deposition material for the deposition material to be evaporated from the substrate (S) includes: a nozzle body (110) wherein multiple nozzles (111) spraying the evaporated deposition material toward the substrate (S) vertically loaded inside the chamber (100) are formed with space therebetween in a vertical direction; an evaporation container (120) wherein a heater (130) is installed and the heater heats the deposition material to be evaporated; and a diffusion means which first diffuses the deposition material evaporated from the deposition container (120) and delivers the evaporated deposition material to a diffusion space (MS), thereby enabling the deposition material to be uniformly sprayed upward and downward and forming an optimum deposition process condition for the substrate (S).</p> |
