发明名称 METHOD FOR IMPROVING CHEMICAL RESISTANCE OF POLYMERIZED FILM, POLYMERIZED FILM FORMING METHOD, FILM FORMING APPARATUS, AND ELECTRONIC PRODUCT MANUFACTURING METHOD
摘要 The present invention provides a method for improving chemical resistance of a polymerized film, which requires no separate processing device for improving the chemical resistance of the polymerized film. The method for improving the chemical resistance of the polymerized film according to an embodiment of the present invention improves the chemical resistance of the polymerized film formed on the surface of an object to be processed, and processed by chemical treatment, wherein the process of improving the chemical resistance of the polymerized film is continuously performed with a process of forming the polymerized film in a process chamber without taking out the object to be processed from the process chamber of a film forming apparatus forming the polymerized film.
申请公布号 KR20150101940(A) 申请公布日期 2015.09.04
申请号 KR20150025820 申请日期 2015.02.24
申请人 TOKYO ELECTRON LIMITED 发明人 SUGITA KIPPEI;YAMAGUCHI TATSUYA;MORISADA YOSHINORI;FUJIKAWA MAKOTO
分类号 B29C71/02;C08J5/18;C08L79/08 主分类号 B29C71/02
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