| 摘要 |
PROBLEM TO BE SOLVED: To provide a formation method of a conductor layer excellent in initial peel strength of the conductor layer, and capable of suppressing decline of peel strength after being placed under a high temperature or a high humidity condition. ! SOLUTION: In a formation method of a conductor layer, a surface provided with a polyimide layer (a) of a polyimide film provided with the polyimide layer (a) on one surface or on both surfaces of a polyimide layer (b) is subjected to a polyimide etching treatment to thereby remove at least a part of the polyimide layer (a), and the conductor layer is formed on the surface. In the formation method of the conductor layer, the etching treatment time is set in a prescribed time range. ! COPYRIGHT: (C)2015,JPO&INPIT |
