发明名称 |
SUBSTRATE ALIGNMENT MARK AND FABRICATING METHOD THEREOF, AND SUBSTRATE |
摘要 |
A substrate alignment mark and a fabricating method thereof, and a substrate are provided. The substrate alignment mark includes a first alignment mark pattern and a second alignment mark pattern that are formed in a different-layer structure on a substrate, the first alignment mark pattern and the second alignment mark pattern are provided with centers thereof aligned and without overlapping portions. Therefore, because two alignment marks are formed in a different-layer structure on a substrate, when uneven film formation occurs in the process of forming one of the alignment marks, causing the alignment mark to be unidentifiable in alignment, the alignment can still be performed by identifying the other alignment mark, thus identification success rate of alignment marks is increased, and then defective rate caused by failure to identify alignment marks in manufacturing process of the substrate is noticeably decreased. |
申请公布号 |
US2015249054(A1) |
申请公布日期 |
2015.09.03 |
申请号 |
US201314358074 |
申请日期 |
2013.06.27 |
申请人 |
BOE TECHNOLOGY GROUP CO., LTD. ;BEIJING BOE DISPLAY TECHNOLOGY CO., LTD. |
发明人 |
Tian Chuan;Hao Zhaohui |
分类号 |
H01L23/544;H01L21/64 |
主分类号 |
H01L23/544 |
代理机构 |
|
代理人 |
|
主权项 |
1. A substrate alignment mark, wherein the substrate alignment mark comprises a first alignment mark pattern and a second alignment mark pattern that are formed in a different-layer structure on a substrate, wherein the first alignment mark pattern and the second alignment mark pattern are provided with centers thereof aligned and without overlapping portions therebetween. |
地址 |
Beijing CN |