| 摘要 |
Method to obtain a highly pure reclaimed polishing material from a polishing-material slurry including already used polishing material. A polishing material is reclaimed from a polishing-material slurry including already used polishing material by undergoing: recovering the polishing-material slurry used to polish an object having silicon as a main component thereof; adjusting the pH of the recovered polishing-material slurry to be in the range of 7-10; adding an alkali earth metal-containing metal salt as an inorganic salt to the pH adjusted polishing-material slurry, to cause the polishing material to agglomerate, and the polishing material is separated from the mother liquor and concentrated; and the polishing material, having been separated and concentrated, is subjected to solid-liquid separation, and recovered. |
| 主权项 |
1. A method for regenerating an abrasive from an abrasive-containing slurry including a used abrasive which was used to polish an object to be polished which is mainly composed of silicon, the method comprising:
(A) collecting the abrasive-containing slurry including the used abrasive; (B) adjusting pH such that pH of the collected abrasive-containing slurry which is converted for 25° C. condition is 7 to 10; (C) separating the abrasive from a mother liquid and concentrating the abrasive by adding a metal salt including an alkali earth metal as an inorganic salt to the abrasive-containing slurry, for which pH was adjusted, to aggregate the abrasive; and (D) collecting the abrasive, which was separated and concentrated, through solid-liquid separation, wherein the abrasive is at least one selected from a group consisting of cerium oxide, diamond, boron nitride, silicon carbide, alumina, alumina-zirconia and zirconium oxide. |
