| 摘要 |
PROBLEM TO BE SOLVED: To provide an abrasive pad capable of suppressing generation of a polishing flaw on an object to be polished.SOLUTION: An abrasive pad includes a polishing layer 10 having a polishing surface 100 for polishing an object to be polished. The polishing layer 10 has a plurality of bubbles 101 set so that each diameter thereof is 50 μm-200 μm, and the total opening ratio of the plurality of bubbles 101 per 3.92×10μmon a cross section on each position in the thickness direction, which is a cross section spreading in a direction orthogonal to the thickness direction, is set at 27%-63%. |
