| 摘要 |
PROBLEM TO BE SOLVED: To provide nanoparticles useful for improving resolution of a photoresist, a photoresist composition using the nanoparticles, and a pattern forming method using the composition.SOLUTION: The nanoparticles include: a core containing a group 4 metal oxide such as HfO; and a coating that surrounds the core and comprises a ligand selected from an organic acid represented by formula (I) and its carboxylate. A new photoresist composition is provided, which comprises the above nanoparticles and a photoacid generator that generates an acid having a pKa lower than a pKa of the ligand acid upon photodecomposition. In formula (I), Rto Reach independently represent H, a 1-8C hydrocarbyl group, a halogen atom, a mercapto group, a cyano group, or the like. |
