RADIATION-SENSITIVE COMPOSITION, MANUFACTURING METHOD THEREFOR, CURED FILM, COLOR FILTER, MANUFACTURING METHOD THEREFOR, PATTERNING METHOD, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE

摘要

This invention provides a radiation-sensitive composition that minimizes residue and exogenous substances while exhibiting good long-duration post-exposure delay characteristics. This invention also provides a method for manufacturing said radiation-sensitive composition, a cured film, a color filter, a manufacturing method therefor, a patterning method, a solid-state imaging element, and an image display device. This radiation-sensitive composition contains a resin and pigments including C.I. Pigment Green 36, C.I. Pigment Yellow 150, and C.I. Pigment Yellow 185. C.I. Pigment Green 36 constitutes 80-86% of the total mass of the pigments in this radiation-sensitive composition, and the mass ratio of C.I. Pigment Yellow 150 to C.I. Pigment Yellow 185 is between 65.4:35.6 and 79.0:21.0, inclusive. The acid value of the resin is between 20 and 50 mg KOH/g, inclusive, and the ratio between the amine value of the resin and the acid value of the resin is between 0.85 and 1.45, inclusive.