| 摘要 |
An exhaust treatment device (100) for treating exhaust includes a main body (110) defining an interior (111), an inlet (115), and an outlet (116); an inlet arrangement (120) disposed at the inlet (115); an aftertreatment substrate (130) disposed between the inlet (115) and the outlet (116); a restrictor arrangement (140) disposed between a first closed end (112) of the main body interior (111) and the aftertreatment substrate (130); and a dosing arrangement (150) configured to inject reactant into the exhaust. The restrictor arrangement (140) defines a restricted passageway (145) that extends towards the first closed end (112) so that exhaust entering the main body interior (111) from the inlet (115) is swirled around the restricted passageway (145) before entering the restricted passageway (145) and passing to a second chamber (119) prior to the aftertreatment substrate (130). |
