主权项 |
1. A semiconductor device comprising:
a first circuit comprising a first node and a second node; a second circuit comprising first to sixth transistors, a third node, a fourth node, and a first wiring; and a third circuit comprising seventh to ninth transistors, first to N-th (N is an even number of 2 or more) inverter circuits, and a second wiring, wherein the first node is configured to hold one of a first potential and a second potential, wherein the second node is configured to hold the other of the first potential and the second potential, wherein the first node is electrically connected to the third node via the first transistor, and is electrically connected to the first wiring via the fifth and sixth transistors, wherein the second node is electrically connected to the fourth node via the fourth transistor, and is electrically connected to the first wiring via the second and third transistors, wherein a gate of the second transistor is electrically connected to the third node, wherein a gate of the fifth transistor is electrically connected to the fourth node, wherein one of a source and a drain of the seventh transistor is electrically connected to the third node, wherein one of a source and a drain of the eighth transistor is electrically connected to the fourth node, wherein the other of the source and the drain of the seventh transistor and the other of the source and the drain of the eighth transistor are electrically connected to the second wiring via the first to N-th inverter circuits, wherein a gate of the seventh transistor and a gate of the eighth transistor are electrically connected to the second wiring via the ninth transistor, and wherein the first, fourth, seventh, and eighth transistors each comprise an oxide semiconductor in a channel formation region. |