| 发明名称 |
PHOTORESIST COMPOSITION, METHOD OF FORMING A PATTERN USING THE SAME, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME |
| 摘要 |
<p>A photoresist composition comprises a photosensitive copolymer having vinyl sulfone as a repeating unit. According to embodiments of the present invention, a photoresist composition comprising a photosensitive copolymer having vinyl sulfone as a repeating unit has excellent adhesion force and hydrophilic properties, and is capable of forming a photoresist pattern having high resolution and sensitivity by using the same.</p> |
| 申请公布号 |
KR20150101074(A) |
申请公布日期 |
2015.09.03 |
| 申请号 |
KR20140022280 |
申请日期 |
2014.02.26 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD.;SNU R&DB FOUNDATION |
发明人 |
HONG, SUK KOO;LEE, JONG CHAN;KWON, SU JEE;KIM, DONG GYUN;LEE, JOON JE;LEE, HYUNG RAE |
| 分类号 |
G03F7/004;G03F7/26 |
主分类号 |
G03F7/004 |
| 代理机构 |
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| 主权项 |
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