发明名称 SATELLITE DISC APPLYING CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>The present invention comprises a receiving groove for receiving a substrate in a reaction chamber which provides a reaction space for forming a semiconductor layer on the substrate. A satellite disk for a chemical vapor deposition apparatus mounted on a susceptor which supports the substrate is made of AlN pellets including residual oxygen of 1% or less.</p>
申请公布号 KR20150101231(A) 申请公布日期 2015.09.03
申请号 KR20140022680 申请日期 2014.02.26
申请人 MICO LTD. 发明人 LEE, WON JIN;SHIN, JIN;PARK, MYOUNG HA
分类号 H01L21/205 主分类号 H01L21/205
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