发明名称 |
SATELLITE DISC APPLYING CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p>The present invention comprises a receiving groove for receiving a substrate in a reaction chamber which provides a reaction space for forming a semiconductor layer on the substrate. A satellite disk for a chemical vapor deposition apparatus mounted on a susceptor which supports the substrate is made of AlN pellets including residual oxygen of 1% or less.</p> |
申请公布号 |
KR20150101231(A) |
申请公布日期 |
2015.09.03 |
申请号 |
KR20140022680 |
申请日期 |
2014.02.26 |
申请人 |
MICO LTD. |
发明人 |
LEE, WON JIN;SHIN, JIN;PARK, MYOUNG HA |
分类号 |
H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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