发明名称 AMORPHOUS SILICON THIN FILM CRYSTALLIZING METHOD AND SILICON THIN FILM CRYSTALLIZING DUPLICATE MONITORING SYSTEM FOR THE SAME
摘要 <p>The present invention relates to a method for crystallizing an amorphous silicon thin film and a silicon thin film crystallization system performing dual monitoring for the same. The method for crystallizing the amorphous silicon thin film according to the embodiment of the present invention includes the steps of: emitting a pulse laser to a silicon thin film sample on a stage; measuring a crystallization degree; additionally measuring a crystallization property if the measured crystallization value is below a target value; and crystallizing the silicon thin film sample. The present invention provides the method for crystallizing the amorphous silicon thin film and the silicon thin film crystallization system performing the dual monitoring for the same, capable of obtaining a high polycrystalline silicon thin film.</p>
申请公布号 KR20150101110(A) 申请公布日期 2015.09.03
申请号 KR20140022369 申请日期 2014.02.26
申请人 FST INC. 发明人 CHANG, MYUNG SHIK;YOO, YOUNG DONG;LIM, JAE WON
分类号 H01L21/324 主分类号 H01L21/324
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