PHOTOCURABLE COMPOSITIONS

摘要

A photocurable composition comprising a photoresist component, and a perfluoropolyether silane is disclosed. The composition enables easier release of phototool from a photoresist.

主权项

1. A photocurable composition comprising:
a) a photoresist component, and b) a perfluoropolyether silane of the formula:
(RPFPE—X1—CO—NH)x—R1—(NH—CO—X2—RSilyl)y,whereRPFPE represents a perfluoropolyether group,X1 and X2 are independently —O—, —S— or —NR2— where R2 is H or C1-C4 alkyl,R1 is a residue of a polyisocyanate,RSilyl is a silane group-containing moiety,subscripts x and y are each independently 1 to 6, and c) a photoinitiator.