PHOTOSENSITIVE RESIN COMPOSITION

摘要

A photosensitive resin composition containing (A), (B), (C), and (D), the amount of (A) being 45-80% by mass in relation to the total amount of (A) and (C): (A) a polymer that contains a structural unit derived from an aromatic carboxylic acid having an ethylenically unsaturated bond and a structural unit derived from an unsaturated compound having a C2-4 cyclic ether structure, said polymer having no structural units that have a C4-6 perfluoroalkyl group; (B) a polymer containing structural unit that has a C4-6 perfluoroalkyl group; (C) a polymeric compound; and (D) a polymerization initiator.