ELECTROSTATIC CHUCK, PLACING TABLE, PLASMA PROCESSING APPARATUS, AND METHOD OF MANUFACTURING ELECTROSTATIC CHUCK

摘要

The present invention suppress the occurrence of particles from an electrostatic chuck and moreover a change of suctioning power about a processed object of the electrostatic chuck. An electrostatic chuck (18b) to maintain a processed object comprises: a base material (21) of a dielectric object and a protective film (23). The base material (21) comprises a surface (S) made of a lower surface (Sa) and a plurality of protrusion parts (Sb). The protrusion parts (Sb) protrude from the lower surface (Sa). Each protrusion part (Sb) comprises a top surface (Sb1) and a side (Sb2). The top surface (Sb1) is a surface which the processed object contacts, and the side (Sb2) is expanded from the lower surface (Sa) to the top surface (Sb1). The protective film (23) is made from yttrium oxide. The protective film (23) is formed on the sides (Sb2) and the lower surfaces (Sa) of the protrusion parts to expose the top surface (Sb1).