发明名称 DISPLAY OR ILLUMINATION DEVICE, AND METHOD FOR FORMING INSULATING FILM
摘要 [Problem] To provide a display or illumination device that has a thin-film transistor as a driving element, the thin film transistor including a semiconductor layer comprising a highly optically degradable substance, wherein a reduction is achieved in the optical degradation that occurs in the the substance and accompanies the use of the the display or illumination device. [Solution] A display or illumination device including a TFT substrate, a first electrode, an insulating film, and a second electrode. The first electrode is provided on the TFT substrate and is connected to the TFT. The insulating film is formed on the first electrode so as to allow the first electrode to be partially exposed and has a total light transmittance in a range of 0-15% at a wavelength of 300-400 nm. The second electrode is provided so as to face the first electrode. The display or illumination device is such that: the insulating film is formed from a radiation-sensitive material; the radiation-sensitive material includes (A) a polymer, (B) a photosensitizer, and (C) a resin such as a novolac resin; and the content of resin (C) in the radiation-sensitive material is 2-200 parts by mass in relation to 100 parts by mass of polymer (A).
申请公布号 WO2015129092(A1) 申请公布日期 2015.09.03
申请号 WO2014JP77042 申请日期 2014.10.09
申请人 JSR CORPORATION 发明人 KUDOU, KAZUNARI;YASUDA, HIROYUKI;YAMAMURA, TETSUYA;KATSUI, HIROMITSU;MIYASAKO, TAKAAKI
分类号 H05B33/22;G03F7/023;H01L51/50;H05B33/12 主分类号 H05B33/22
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