| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To produce a silsesquioxane containing thiol group, essentially free from a residual silanol group, composed mainly of a polyhedral oligomeric silsesquioxane structure, containing multiple thiol groups in a molecule, having high storage stability of the compound itself and a composition containing the compound, and providing a cured material having high heat-resistance. <P>SOLUTION: The method for producing the silsesquioxane (A) containing thiol group and essentially free from residual silanol group comprises hydrolysis of a thiol group-containing alkoxysilane (a1) expressed by general formula (1): R<SP POS="POST">1</SP>Si(OR<SP POS="POST">2</SP>)<SB POS="POST">3</SB>(in the formula, R<SP POS="POST">1</SP>is a 1-8C hydrocarbon group having at least one thiol group or aromatic hydrocarbon group having at least one thiol group; and R<SP POS="POST">2</SP>is a hydrogen atom, 1-8C hydrocarbon group or aromatic hydrocarbon group) with water and an acidic catalyst, removal of the acidic catalyst and condensation of the reaction product by adding the product to a polar solvent containing a basic catalyst. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
