| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing substrates for electro-optical devices, even when a plurality of translucent films with different refractive indices are superposed on the upper layer of a reflective layer, capable of appropriately setting a polishing amount and an etching amount from a surface side of a translucent film on the basis of a measurement result of a film thickness of the translucent film, and the substrate for the electro-optical devices. <P>SOLUTION: The method for manufacturing a substrate 10 for electro-optical devices includes: forming reflection patterns 7z and 9z for a monitor on a same layer of a pixel electrode 9a or a lower layer side than the pixel electrode 9a; and forming a first translucent film 181 and a second translucent film 182 on an upper layer side of the reflection patterns 7z and 9z for the monitor. After a part of the second translucent film 182 that is overlapped with the reflection patterns 7z and 9z for the monitor is removed, a third translucent layer 17 is formed. In such a state, light is applied to the reflection patterns 7z and 9z for the monitor to measure the film thickness. <P>COPYRIGHT: (C)2013,JPO&INPIT |
