| 摘要 |
<p>The present invention relates to a chemical vapor deposition apparatus. According to an embodiment of the present invention, the chemical vapor deposition apparatus includes: a deposition chamber; a substrate positioning unit which is located inside the deposition chamber, and has a substrate positioned thereon; a initiator providing unit which is prepared on the outside of the deposition chamber, and provides a liquefied initiator; a monomer providing unit which is prepared on the outside of the deposition chamber, and provides a liquefied monomer; a spraying unit which is coupled to the deposition chamber, and generates a mixed liquid drop by spraying a mixed liquid of the liquefied initiator and the liquefied monomer provided from the initiator providing unit and the monomer providing unit onto an upper part of the substrate; and a heating unit which is located on the upper part of the substrate, and heats and vaporizes the mixed liquid drop as the mixed liquid drop sprayed through the spraying unit passes.</p> |
