| 摘要 |
Provided is a radiation-sensitive resin composition for immersion exposure, a curing pattern forming method and a curing pattern ideally used in an immersion exposure process for exposing a resist film via a liquid for immersion exposure, such as water. The radiation-sensitive resin composition for immersion exposure comprises a structure obtained by hydrolysis-condensation of a silane compound represented by the formula [R1 aSiX4-a] and/or a silane compound represented by the formula [SiX4], and contains a silicon-containing polymer having a weight average molecular weight of 1,000 to 200,000 according to GPC, a fluorine-containing polymer, and an acid generator. (In each formula: R1 represents a fluorine atom, an alkylcarbonyloxy group, or an alkyl group with 1 to 20 carbons; X represents a chlorine atom, a bromine atom, or OR (where R is a monovalent organic group); and a represents an integer from 1 to 3.) |
